Optimized deposition parameters for titanium nitride coatings: Enhancing mechanical properties of Al 6011 substrates via DC sputtering
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Dec 15, 2024
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Abstract
The growing demand for advanced coatings in industries such as aerospace and automotive necessitates materials with superior hardness, wear resistance, and thermal stability. Despite advancements in ternary coatings, research on binary Titanium Nitride (TiN) coatings remains limited, particularly in optimizing deposition parameters for lightweight aluminum substrates. This study aims to investigate the effects of sputtering parameters, specifically Ar:N₂ gas ratios and deposition durations, on the mechanical properties of TiN coatings on Al 6011 substrates. The optimized conditions (70Ar:30N₂ gas ratio and 60-minute deposition) yielded a 165% increase in surface hardness (88.92 HV) and a 54% reduction in wear rate compared to untreated samples. XRD and SEM analyses confirmed the dense microstructure and strong (200) phase orientation contributing to these enhancements. This research highlights a cost-effective and scalable approach to improving the performance of aluminum alloys, bridging the gap between fundamental studies and industrial applications.
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References
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[17] Y. Zhang, Y. Yang, Y. Zhai, and P. Zhang, “Effect of negative substrate bias on the microstructure and mechanical properties of Ti-Si-N films deposited by a hybrid filtered cathodic arc and ion beam sputtering technique,” Applied Surface Science, vol. 258, no. 18, pp. 6897–6901, 2012, doi: 10.1016/j.apsusc.2012.03.127.
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[21] W. Andriyanti et al., “Magnetic properties and microstructural of ion-implanted Gadolia doped Ceria-Barium monoferrite thin film deposited on Kapton for electromagnetic wave absorber application,” Journal of Alloys and Compounds, vol. 1005, no. August, p. 176207, 2024, doi: 10.1016/j.jallcom.2024.176207.
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[23] G. Rane, U. Krause, P. Dürrenfeld, H. Wang, and X. Zhang, “Significant texture and wear resistance improvement of TiN coatings using pulsed DC magnetron sputtering,” Applied Surface Science, vol. 23, no. June, p. 157709, 2023, doi: 10.1016/j.apsusc.2023.157709.
[24] P. J. Kelly and R. D. Arnell, “Magnetron sputtering: A review of recent developments and applications,” Vacuum, vol. 56, no. 3, pp. 159–172, 2000, doi: 10.1016/S0042-207X(99)00189-X.
[25] A. Kavitha, R. Kannan, P. Sreedhara Reddy, and S. Rajashabala, “The effect of annealing on the structural, optical and electrical properties of Titanium Nitride (TiN) thin films prepared by DC magnetron sputtering with supported discharge,” Journal of Materials Science: Materials in Electronics, vol. 27, no. 10, pp. 10427–10434, 2016, doi: 10.1007/s10854-016-5130-0.
[26] A. Kavitha, R. Kannan, K. R. Gunasekhar, and S. Rajashabala, “Effect of Nitrogen Content on Physical and Chemical Properties of TiN Thin Films Prepared by DC Magnetron Sputtering with Supported Discharge,” Journal of Electronic Materials, vol. 46, no. 10, pp. 5773–5780, 2017, doi: 10.1007/s11664-017-5608-4.
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